Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage: Journal of Vacuum Science & Technology B: Vol 29, No 1
Chapter 5-1. Chemcal Etching. - ppt video online download
Oxygen Plasma | O2 Plasma | Plasma Etch, Inc.
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Plasma Etching of SiO2 with High Selectivity Against Si3N4 and Si
Micromachines | Free Full-Text | SF6 Optimized O2 Plasma Etching of Parylene C | HTML
Dry Etching - an overview | ScienceDirect Topics
SF6 Optimized O2 Plasma Etching of Parylene C
Damage of Cr film by oxygen plasma - ScienceDirect
Plasma-Based Nanostructuring of Polymers: A Review
Chapter 10 Etching Introduction to etching. - ppt video online download
Single-step plasma-induced hierarchical structures for tunable water adhesion | Scientific Reports
Fabrication of amorphous silica nanowires via oxygen plasma treatment of polymers on silicon
Chapter 10 Etching III - University of Waterloo
Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties
SF6 Optimized O2 Plasma Etching of Parylene C
Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon - Sun - 2018 - Advanced Materials Interfaces - Wiley Online Library
Versatile fabrication and applications of dense, orderly arrays of polymeric nanostructures over large areas - Journal of Materials Chemistry B (RSC Publishing)
1. Introduction
Si02 etch rates v� in CF 4 /02 (0), NF3/Ar (U), and F2/Ar (©)plasmas,... | Download Scientific Diagram
Tight-binding quantum chemical molecular dynamics simulations for the elucidation of chemical reaction dynamics in SiC etching with SF6/O2 plasma - Physical Chemistry Chemical Physics (RSC Publishing)
Morphological and Chemical Effects of Plasma Treatment with Oxygen (O2) and Sulfur Hexafluoride (SF6) on Cellulose Surface
Chapter 10 Etching Introduction to etching. - ppt video online download
Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion - ScienceDirect
Fabrication of polymer nanowires via maskless O2 plasma etching - IOPscience
Development and characterization of plasma etching processes for the dimensional control and LWR issues during High-k Metal gate
Chapter 5-1. Chemcal Etching. - ppt video online download
![PDF] Remote plasma etching of silicon nitride and silicon dioxide using NF3/ O2 gas mixtures | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/75e6c783614f9cc013ed44219523e971c489440f/2-Figure2-1.png "PDF] Remote plasma etching of silicon nitride and silicon dioxide using NF3/ O2 gas mixtures | Semantic Scholar")